the firm's post-grant practitioners are some of the most experienced in the country.

Maki  Saitoh
Vincent K. Shier, Ph.D.
Alexander B. Englehart
Colin B. Harris
Philippe J.C. Signore, Ph.D.
Yorikatsu  Hohokabe, Ph.D.
Aristotelis M. Psitos
Peifang  Tian, Ph.D.
Yin Y. Nelson, Ph.D.
Robert  Tarcu
Michael R. Casey, Ph.D.
Kevin L. Hartman, Ph.D.
Bogdan A. Zinchenko
Yuki  Onoe
Norman F. Oblon
Kevin M. McKinley
Thomas M. Cunningham, Ph.D.
Teddy S. Gron
Derek  Lightner, Ph.D.
Erik M. Stang, Ph.D.
Brian B. Darville
Jay E. Rowe, Jr., Ph.D.
Stefan Uwe  Koschmieder, Ph.D.
Carl E. Schlier
Yuanyi (Alex) Zhang
Robert W. Downs
Richard D. Kelly
Eckhard H. Kuesters
Arthur I. Neustadt
Daniel J. Pereira, Ph.D.
Nanlin  Wang, Ph.D.
Kurt M. Berger, Ph.D.
Marina I. Miller, Ph.D.
Soumya  Panda
Edwin D. Garlepp
Sameer  Gokhale
Aldo  Martinez
Andrew M. Ollis
John  Sipos
Ryan W. Smith
Kasumi  Kanetaka
John F. Presper
J. Derek  Mason, Ph.D., CLP
Elissa L. Sanford
Yanwen  Fei
Diane  Jones
Alec M. Royka
Matthew H. Everhart, Ph.D.
Craig R. Feinberg
James R. Love
Surinder  Sachar
Eric W. Schweibenz
Jenchieh (Joseph) Yuan
Anna Z. Lloyd
Johnny  Ma
Nicholas  Rosa, Ph.D.
John S. Kern
Jianping (James)  Wu
Stephen G. Baxter, Ph.D.
Robert T. Pous
Long  Phan, Ph.D.
Grace E. Kim
Christopher  Ricciuti
Tao  Feng, Ph.D.
Charles L. Gholz
Steven B. Chang
David M. Longo, Ph.D.
Kevin Ross  Davis
Dale M. Shaw
Akihiro  Yamazaki
Ching-Cheng (Tony)  Chang
Christopher I. Donahue
Tia D. Fenton
Chika (Teranishi) Iitoyo
Jeffrey B. McIntyre
Frank J. West

Technologies

Artificial Intelligence (AI)
Artificial Intelligence (AI)
Digital Health
Digital Health
Energy & Renewables
Energy & Renewables

Fast Facts

About Our

Law Firm

About Our Law Firm

Headquartered within steps of the USPTO with an affiliate office in Tokyo, Oblon is one of the largest law firms in the United States focused exclusively on intellectual property law.

Get to know our

History

Get to know our History

1968
Norman Oblon with Stanley Fisher and Marvin Spivak launched what was to become Oblon, McClelland, Maier & Neustadt, LLP, one of the nation's leading full-service intellectual property law firms.

Our Local and

Global Reach

Our Local and Global Reach

Outside the US, we service companies based in Japan, France, Germany, Italy, Saudi Arabia, and farther corners of the world. Our culturally aware attorneys speak many languages, including Japanese, French, German, Mandarin, Korean, Russian, Arabic, Farsi, Chinese.

A few of our

ACCOLADES

A few of our ACCOLADES

Oblon's professionals provide industry-leading IP legal services to many of the world's most admired innovators and brands.

OPPORTUNITIES FOR YOUR

Career

OPPORTUNITIES FOR YOUR Career

From the minute you walk through our doors, you'll become a valuable part of a team that fosters a culture of innovation, client service and collegiality.

A few ways to

GET In Touch

A few ways to GET In Touch
US Office

Telephone: 703-413-3000
Learn More +


Tokyo Office

Telephone: +81-3-6212-0550
Learn More +

Downloadable

Patent Forms

Downloadable Patent Forms

The United States Patent and Trademark Office (USPTO) issued final rules implementing the inventor's oath or declaration provisions of the America Invents Act (AIA) on August 14, 2012.

Yuanyi (Alex) Zhang

Yuanyi (Alex) Zhang

Technical Advisor
E: yzhang@oblon.com
T: 703-412-5928
F: 703-413-2220
Join My LinkedIn Network
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Yuanyi (Alex) Zhang is a technical advisor in the firm’s Electrical Patent Prosecution practice group where he focuses on drafting patent applications and patent prosecution for domestic and international clients. Dr. Zhang’s technical expertise includes semiconductor devices, organic chemistry, polymer chemistry and physics, and material characterization.

Prior to joining the firm, Dr. Zhang conducted research on diverse chemical technologies. He devised and developed novel lithographic patterning techniques in his PhD studies. He worked at Applied Materials as a process engineer intern and is well versed in semiconductor technologies. Dr. Zhang also investigated multicomponent reactions for click chemistry, developed a versatile platform for effectively synthesizing polymers, and discovered a new type of metal adhesives. Dr. Zhang is skilled at solving interdisciplinary problems and communicating research with researchers from various backgrounds.

Dr. Zhang holds 11 academic publications and 3 patent applications. He is also a reviewer for the Journal of Polymer Science.


Education

  • University of California, Santa Barbara (Ph.D.)
    • Chemical Engineering
  • Tsinghua University, Beijing, China (B.S.)
    • Chemistry

Speeches/Events/Publications

SELECTED CONFERENCE PRESENTATIONS

Y. Zhang, et al. "(Self-Assembled-Monolayer) SAM-Free Selective Deposition," Semiconductor Research Corporation TECHCON, Austin, TX, September 2019
Y. Zhang, et al. "Selective Spin-on Deposition of Polymers on Heterogeneous Surfaces," American Physical Society (APS) March Meeting, Boston, MA, March 2019
Y. Zhang, et al. "Selective Spin-on Deposition Enabled by Imperfect Self-Assembled Monolayers," International Society for Optics and Photonics (SPIE) Advanced Lithography Conference, San Jose, CA, February 2019

SELECTED PUBLICATIONS

Y. Zhang, et al. “Single-Step, Spin-on Process for High Fidelity and Selective Polymer Deposition,” ACS Appl. Polym. Mater. 2020, 2 (2), 481-486. Featured as ACS Editors' Choice
Y. Zhang, et al. “Rapid and Selective Deposition of Patterned Thin Films on Heterogeneous Substrates via Spin Coating,” ACS Appl. Mater. Interfaces 2019, 11 (23), 21177-21183
Y. Zhang, et al. “Postpolymerization Modification of Poly(dihydropyrimidin-2(1H)-thione)s via the Thiourea- Haloalkane Reaction to Prepare Functional Polymers,” ACS Macro Lett. 2015, 4(8), 843-847
Y. Zhang, et al. “From Drug to Adhesive: a New Application of Poly(Dihydropyrimidin-2(1H)-one)s via the Biginelli Polycondensation,” Polym. Chem. 2015, 6(27), 4940-4945

PATENT PUBLICATIONS

Y. Zhang, et al. “Method of Coating an Object,” US Patent Application, 2019, US 16/549,490
Y. Zhang, et al. “Selective Coating of a Structure,” US Patent Application, 2019, US 16/697,288
Y. Zhang, et al. “Patterned Discrete Nanoscale Doping of Semiconductors, Methods of Manufacture Thereof and Articles Comprising the Same,” US Patent Application, 2018, US 16/032,695; Japanese Patent Application, 2019, JP2019128966A; Chinese Patent Application, 2019, CN201910627069.XA

Languages

  • Chinese