Headquartered within steps of the USPTO with an affiliate office in Tokyo, Oblon is one of the largest law firms in the United States focused exclusively on intellectual property law.
1968
Norman Oblon with Stanley Fisher and Marvin Spivak launched what was to become Oblon, McClelland, Maier & Neustadt, LLP, one of the nation's leading full-service intellectual property law firms.
Outside the US, we service companies based in Japan, France, Germany, Italy, Saudi Arabia, and farther corners of the world. Our culturally aware attorneys speak many languages, including Japanese, French, German, Mandarin, Korean, Russian, Arabic, Farsi, Chinese.
Oblon's professionals provide industry-leading IP legal services to many of the world's most admired innovators and brands.
From the minute you walk through our doors, you'll become a valuable part of a team that fosters a culture of innovation, client service and collegiality.
The United States Patent and Trademark Office (USPTO) issued final rules implementing the inventor's oath or declaration provisions of the America Invents Act (AIA) on August 14, 2012.
Les Nouvelles - Licensing Executives Society International (LESI)
November 11, 2024
October 9-10, 2024 in Tokyo and Osaka
October 1 and 3, 2024
Yuanyi (Alex) Zhang, Ph.D., is a technical advisor in the firm’s Electrical Patent Prosecution practice group where he focuses on drafting patent applications and patent prosecution for domestic and international clients. Dr. Zhang’s technical expertise includes semiconductor devices, organic chemistry, polymer chemistry and physics, and material characterization.
Prior to joining the firm, Dr. Zhang conducted research on diverse chemical technologies. He devised and developed novel lithographic patterning techniques in his PhD studies. He worked at Applied Materials as a process engineer intern and is well versed in semiconductor technologies. Dr. Zhang also investigated multicomponent reactions for click chemistry, developed a versatile platform for effectively synthesizing polymers, and discovered a new type of metal adhesives. Dr. Zhang is skilled at solving interdisciplinary problems and communicating research with researchers from various backgrounds.
Dr. Zhang holds 11 academic publications and 3 patent applications. He is also a reviewer for the Journal of Polymer Science.
SELECTED CONFERENCE PRESENTATIONS
Y. Zhang, et al. "(Self-Assembled-Monolayer) SAM-Free Selective Deposition," Semiconductor Research Corporation TECHCON, Austin, TX, September 2019
Y. Zhang, et al. "Selective Spin-on Deposition of Polymers on Heterogeneous Surfaces," American Physical Society (APS) March Meeting, Boston, MA, March 2019
Y. Zhang, et al. "Selective Spin-on Deposition Enabled by Imperfect Self-Assembled Monolayers," International Society for Optics and Photonics (SPIE) Advanced Lithography Conference, San Jose, CA, February 2019
SELECTED PUBLICATIONS
Y. Zhang, et al. “Single-Step, Spin-on Process for High Fidelity and Selective Polymer Deposition,” ACS Appl. Polym. Mater. 2020, 2 (2), 481-486. Featured as ACS Editors' Choice
Y. Zhang, et al. “Rapid and Selective Deposition of Patterned Thin Films on Heterogeneous Substrates via Spin Coating,” ACS Appl. Mater. Interfaces 2019, 11 (23), 21177-21183
Y. Zhang, et al. “Postpolymerization Modification of Poly(dihydropyrimidin-2(1H)-thione)s via the Thiourea- Haloalkane Reaction to Prepare Functional Polymers,” ACS Macro Lett. 2015, 4(8), 843-847
Y. Zhang, et al. “From Drug to Adhesive: a New Application of Poly(Dihydropyrimidin-2(1H)-one)s via the Biginelli Polycondensation,” Polym. Chem. 2015, 6(27), 4940-4945
PATENT PUBLICATIONS
Y. Zhang, et al. “Method of Coating an Object,” US Patent Application, 2019, US 16/549,490
Y. Zhang, et al. “Selective Coating of a Structure,” US Patent Application, 2019, US 16/697,288
Y. Zhang, et al. “Patterned Discrete Nanoscale Doping of Semiconductors, Methods of Manufacture Thereof and Articles Comprising the Same,” US Patent Application, 2018, US 16/032,695; Japanese Patent Application, 2019, JP2019128966A; Chinese Patent Application, 2019, CN201910627069.XA