Joint International Symposium on U.S. and European Patent Practice 2019

The Oblon and Maiwald firms are pleased to invite you to a complementary:

Joint International Symposium on U.S. and European Patent Practice that will be presented in two convenient locations/dates:

1. Tokyo: Monday, June 3, 2019 at the Fukuracia Marunouchi Oazo
2. Osaka: Monday, June 10, 2019 at the Osaka Science & Technology Center

This complimentary symposium will include serial translation from English to Japanese.
Drinks and hors d’oeuvres will be provided at a casual reception following the symposium.

If you plan to attend, please send an e-mail to patentconference@oblon.com or events@maiwald.eu, identifying your name, affiliated company, and place of participation (Tokyo or Osaka). The final registration deadline is May 15, 2019 and attendance is limited to 100 participants in Tokyo and 60 in Osaka.


We look forward to welcoming you and your colleagues.

Click here for full event details: English and Japanese