Headquartered within steps of the USPTO with an affiliate office in Tokyo, Oblon is one of the largest law firms in the United States focused exclusively on intellectual property law.
1968
Norman Oblon with Stanley Fisher and Marvin Spivak launched what was to become Oblon, McClelland, Maier & Neustadt, LLP, one of the nation's leading full-service intellectual property law firms.
Outside the US, we service companies based in Japan, France, Germany, Italy, Saudi Arabia, and farther corners of the world. Our culturally aware attorneys speak many languages, including Japanese, French, German, Mandarin, Korean, Russian, Arabic, Farsi, Chinese.
Oblon's professionals provide industry-leading IP legal services to many of the world's most admired innovators and brands.
From the minute you walk through our doors, you'll become a valuable part of a team that fosters a culture of innovation, client service and collegiality.
The United States Patent and Trademark Office (USPTO) issued final rules implementing the inventor's oath or declaration provisions of the America Invents Act (AIA) on August 14, 2012.
Les Nouvelles - Licensing Executives Society International (LESI)
May 20, 2025 at 13:00 JST, Tokyo Japan
November 11, 2024
October 9-10, 2024 in Tokyo and Osaka
Oblon recently requested that the United States Patent and Trademark Office (USPTO) revise rules that require disclosure of information relating an inventor’s residential address. This request was motivated by privacy concerns regarding the disclosure of information relating to the residential addresses of inventors. The concerns are centered upon two specific issues: (1) the impending implementation of the General Data Protection Regulation (GDPR) of the European Union, and (2) identify theft. The GDPR strictly regulates the disclosure of any data that could be used to directly or indirectly identify a person (i.e. “personal data”), including, e.g. information relating to the residential addresses of individuals. The request from Oblon to the USPTO can be read here.