the firm's post-grant practitioners are some of the most experienced in the country.


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About Our

Law Firm

About Our Law Firm

Headquartered within steps of the USPTO with an affiliate office in Tokyo, Oblon is one of the largest law firms in the United States focused exclusively on intellectual property law.

Get to know our


Get to know our History

Norman Oblon with Stanley Fisher and Marvin Spivak launched what was to become Oblon, McClelland, Maier & Neustadt, LLP, one of the nation's leading full-service intellectual property law firms.

Our Local and

Global Reach

Our Local and Global Reach

Outside the US, we service companies based in Japan, France, Germany, Italy, Saudi Arabia, and farther corners of the world. Our culturally aware attorneys speak many languages, including Japanese, French, German, Mandarin, Korean, Russian, Arabic, Farsi, Chinese.

A few of our


A few of our ACCOLADES

Oblon's professionals provide industry-leading IP legal services to many of the world's most admired innovators and brands.




From the minute you walk through our doors, you'll become a valuable part of a team that fosters a culture of innovation, client service and collegiality.

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GET In Touch

A few ways to GET In Touch
US Office

Telephone: 703-413-3000
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Tokyo Office

Telephone: +81-3-6212-0550
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Patent Forms

Downloadable Patent Forms

The United States Patent and Trademark Office (USPTO) issued final rules implementing the inventor's oath or declaration provisions of the America Invents Act (AIA) on August 14, 2012.

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David M. Longo, Ph.D.

David M. Longo, Ph.D.

Partner ∙ US Office
T: (703) 412-1791
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David M. Longo, Ph.D. is a partner in the firm’s Electrical, Mechanical, and Design practice groups, and is the chair of the firm’s Prosecution Management Committee.  His attention to details, determination, and focus on prompt and efficient communications have garnered the confidence of the firm’s clients in his ability to diligently handle their important matters.  International and domestic clients rely on him to help them develop and grow their patent portfolios.

His legal practice covers all aspects of strategic counseling and patent portfolio management.  This includes patent prosecution, reissue applications, reexamination requests, ex parte appeals, opinions of counsel, freedom-to-operate and landscape analyses, due diligence analyses, pre-litigation counseling, and license negotiations. He also regularly travels to Europe and Japan to speak on a variety of U.S. patent law topics for clients and practitioners.

Dr. Longo’s technical experience bridges the materials science and electrical engineering fields, particularly in the areas of semiconductor materials and devices, semiconductor processing and characterization, thin film deposition and analysis, nanotechnology (including nanoprinting, nanocomposites, nanocrystals, and nanoparticles), battery materials (including anode and cathode materials for lithium and Li-ion batteries), alternative lithography technologies, fiber optics/optoelectronics, and microelectromechanical systems (MEMS). He also has significant experience in focused ion beam (FIB) microscopy and micromachining, transmission electron microscopy (TEM), scanning electron microscopy (SEM), and atomic force microscopy (AFM). Collectively, this experience has enabled Dr. Longo to help his clients obtain patents across a diverse array of technical fields, from consumer electronic products to medical devices, photovoltaics, and battery management systems (BMS).

His Ph.D. dissertation, entitled “Development of a Deep Submicron Printing Technology,” significantly contributed to a Defense Advanced Research Projects Agency (DARPA) project for nanoscale printing of electronic materials onto planar and curved surfaces.  His experimental research applied FIB direct-write technology to fabricate complex nanoscale patterns on reusable printheads.  Elastomer replicas of the printheads were cast, coated with self-assembled monolayers, and ultimately “printed” onto semiconductor substrates and glass lenses using a combination of microcontact printing and etching.  Other academic research involved FIB microscopy and FIB-assisted material deposition, as well as analytical TEM to study the effects of heat treatment on nanoscale films and diffusion barriers deposited onto single-crystal silicon substrates.

Dr. Longo has several technical publications and has spoken on his nanoscale printing research at technical conferences. He has also spoken on developments in U.S. patent law and the patenting process at technical meetings in the U.S., as well as at nanotech consultancy conferences in Spain and Egypt.

Prior to joining the firm, Dr. Longo worked for another law firm primarily in the areas of patent counseling and prosecution, and worked full time as a patent agent while attending law school.


  • George Washington University Law School (J.D.)
  • University of Virginia (Ph.D.)
    • Materials Science & Engineering
  • University of Virginia (M.S.)
    • Materials Science & Engineering
  • University of Scranton (B.S.)
    • Physics & Philosophy


  • Virginia
  • District of Columbia
  • New Jersey
  • U.S. Patent and Trademark Office
  • Eastern District of Virginia
  • Court of Appeals for the Federal Circuit
  • Court of Appeals for Veterans Claims
  • U.S. Supreme Court


  • The Best Lawyers in America® (2024)
  • IAM Patent 1000: The World’s Leading Patent Practitioners, named as Top Patent Professional (2023, 2024)
  • Second Prize in Nathan Burkan Memorial Paper Competition, sponsored by A.S.C.A.P., for paper entitled “Using the D.M.C.A. Anticircumvention Provisions to Avoid § 102(b) of the Copyright Act and the Limited Times Clause in Art. I, § 8 of the U.S. Constitution” (2004)
  • Received five awards between 1998 and 2000 for research and scholastic activities while a graduate student.

Technical Publications

  • Y. Liu, D.M. Longo, and R. Hull, “Ultra Rapid Nanostructuring of Polymethlmethacrylate (PMMA) films using Ga+ focused ion beams,” Appl. Phys. Lett., 82(3), 346-348, (2003).
  • R. Hull, T. Chraska, Y. Liu, and D.M. Longo, “Microcontact Printing: New Mastering and Transfer Techniques for High Throughput, Resolution, and Depth of Focus,” Mat. Sci. Eng. C19, 383-392 (2002).
  • D.M. Longo, W.E. Benson, T. Chraska, and R. Hull, “Deep Submicron Microcontact Printing of Electronic Materials Utilizing Focused Ion Beam Fabricated Printheads,” Appl. Phys. Lett., 78(7), 981-983, (2001).
  • D.M. Longo and R. Hull, “Direct Focused Ion Beam Writing of Printheads for Pattern Transfer Utilizing Microcontact Printing,” Mat. Res. Soc. Symp. Proc.: Materials Development for Direct Write Technologies, 624, 157-162, (2001).
  • D.M. Longo and R. Hull, “Microcontact Printing (µCP) of Electronic Materials Utilizing Focused Ion Beam Fabricated Printheads,” Proc. 1999 Intl. Semicond. Dev. Res. Symp., 33-36 (1999).
  • R. Hull and D.M. Longo, “Development of a Nanoscale Printing Technology for Planar and Curved Surfaces,” Proc. 10th Intl. Work. Phys. Semicond. Dev., New Delhi, India, II, 974-981 (1999); also available through the Proceedings of SPIE (The Int’l Soc. of Optical Eng.) 3975, 974-981 (2000).
  • D.M. Longo, J.M. Howe, and W.C. Johnson, “Development of a Focused Ion Beam (FIB) Technique to Minimize X-ray Fluorescence during Energy Dispersive X-ray Spectroscopy (EDS) of FIB Specimens in the Transmission Electron Microscope (TEM),” Ultramicroscopy, 80(2), 85-97, (1999).
  • D.M. Longo, J.M. Howe, and W.C. Johnson, “Experimental Method for Determining Cliff-Lorimer Factors in Transmission Electron Microscopy (TEM) Utilizing Stepped Wedge-Shaped Specimens Prepared by Focused Ion Beam (FIB),” Ultramicroscopy, 80(2), 69-84, (1999). (Micrographs from this article selected by editor Pieter Kruit for the cover illustration of the Oct. 1999 issue of Ultramicroscopy.)
  • D.M. Longo, J.M. Howe, and W.C. Johnson, “The Effect of Focused Ion Beam (FIB) Specimen Geometry on X-ray Fluorescence During Energy Dispersive X-ray Spectroscopy (EDS) Analysis in the Transmission Electron Microscope (TEM),” Proc. of Microscopy and Microanalysis, 4, 856-857, (1998).  

Professional Affiliations

  • American Intellectual Property Law Association (AIPLA)
  • U.S. Bar – Japan Patent Office Liaison Council (represent Virginia Bar IP Section)
  • Materials Research Society (MRS)
  • Institute of Electrical and Electronics Engineers (IEEE)