







Headquartered within steps of the USPTO with an affiliate office in Tokyo, Oblon is one of the largest law firms in the United States focused exclusively on intellectual property law.

1968
Norman Oblon with Stanley Fisher and Marvin Spivak launched what was to become Oblon, McClelland, Maier & Neustadt, LLP, one of the nation's leading full-service intellectual property law firms.

Outside the US, we service companies based in Japan, France, Germany, Italy, Saudi Arabia, and farther corners of the world. Our culturally aware attorneys speak many languages, including Japanese, French, German, Mandarin, Korean, Russian, Arabic, Farsi, Chinese.

Oblon's professionals provide industry-leading IP legal services to many of the world's most admired innovators and brands.

From the minute you walk through our doors, you'll become a valuable part of a team that fosters a culture of innovation, client service and collegiality.

The United States Patent and Trademark Office (USPTO) issued final rules implementing the inventor's oath or declaration provisions of the America Invents Act (AIA) on August 14, 2012.
by Sana Tahir, Law Clerk and Andrew Ollis, Partner
by Andrew Ollis, Partner and Sana Tahir, Law Clerk



Fumika Ogawa is an Associate Attorney in the firm’s Electrical and Mechanical Patent Prosecution group, focusing on preparing and prosecuting patent applications for domestic and international clients.
Prior to joining the firm, Ms. Ogawa worked as a patent translator at a Japanese multinational imaging and electronics company, and later as a bilingual patent professional at a US-based IP boutique where she gained experience managing large-scale U.S. patent prosecution portfolios, resulting in over 15 years of cross-border IP experience supporting and collaborating with inventors, in-house IP teams, and foreign counsels. Ms. Ogawa has experience in a wide variety of technological fields including electrochemical batteries and related technologies, power management systems, electronic circuitry, software, semiconductor devices, photoresist composition, catalysts, adhesives, ink compositions, automobile and consumer product designs.
