Oblon Spivak Receives Ricoh’s Patent Firm Best Practices Award

October 8, 2014 – Firm News

Oblon Spivak's long standing client Ricoh Company, LTD has selected the firm as the first-ever U.S. law firm to receive their annual Patent Firm Best Practice Award.

The Patent Firm Best Practice Award is given by the company's IP division to one of the best performing patent firms every year. The award was given in recognition of the firm's outstanding IP activities and for its strategic contributions in the advancement of Ricoh's business objectives through IP policies. The award was presented on July 30th to Oblon Spivak's James Kulbaski and Jacob Doughty in Tokyo, Japan at Ricoh's Annual IP Patent Firm Meeting.

Until this year, the eligible nominees have been limited to Japanese patent firms, thus making Oblon Spivak the first-ever U.S. law firm to receive the honor. Oblon Spivak's careful and independent analysis of prior art, competitors' products, and the disclosed invention has steadily grown Oblon Spivak's patent practice and solidified its reputation as a go to firm for patent protection.