Patent Reissue: Benefits, Limitations and Strategies

July 12, 2011
Strafford Publications
Live CLE Webinar: Tuesday, July 12, 2011 - 1:00pm-2:30pm EDT

Scott A. McKeown of Oblon, Spivak will be a panelist in the above webinar.  This CLE webinar will provide guidance to counsel for parties impacted by the patent reissue process. The panel will discuss the benefits and limitations of patent reissue, review recent developments, and outline best practices to utilize reissue to protect IP rights.

In 2010, there were more reissued patents than in any year in history. While patent holders can benefit from using the reissue process to correct patent defects, there are limitations that must be understood and considered.

When making the determination to initiate the reissue process, a patent holder must understand how pending litigation and licensing deals could be affected by the patent reissue. Patentees and their counsel must carefully evaluate whether and when to make a reissue application.

In addition, counsel must consider key recent developments, including a recent Federal Circuit decision reversing the Board of Patent Appeals and Interferences and holding that omission of narrower dependent claims can be a basis for the filing of a reissue application.

Listen as the authoritative panel of patent attorneys examines the benefits and limitations of patent reissue and discusses recent developments and the strategic use of reissue to protect IP rights.

The panel will review these and other key questions:

  • What limitations are posed by using reissue proceedings to resolve issues of patent validity?
  • What factors should be considered when deciding whether to initiate the reissue process?
  • How have the courts and the USPTO treated reissue cases?

Following the speaker presentations, you'll have an opportunity to get answers to your specific questions during the interactive Q&A.

Please click on the above link for additional information and to sign up for this webinar.